I n s i t u observation on electron beam induced chemical vapor deposition by Auger electron spectroscopy
- 31 August 1987
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 51 (9) , 646-648
- https://doi.org/10.1063/1.98343
Abstract
W deposition, using WF6 gas source by electron beam induced surface reaction, has been studied by Auger electron spectroscopy. W Auger electron signals have been observed for WF6 adlayer by Auger electron spectroscopy. Moreover, initial growth for W deposition has been observed in situ by Auger electron spectroscopy. As a result, it became clear that a growth rate for W deposition is proportional to WF6 gas pressure and can be ∼1 Å/min at 2×10−7 Torr.Keywords
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