Calcul exact de la fonction de distribution des ions incidents sur une cible dans le cas d'un plasma de pulvérisation
- 1 January 1982
- journal article
- Published by EDP Sciences in Journal de Physique
- Vol. 43 (2) , 279-283
- https://doi.org/10.1051/jphys:01982004302027900
Abstract
In sputtering plasma, the sputtering rate depends upon the energy distribution of the ions that strike the target. Usually this function is intuitively determined. This paper describes the exact computation for thisKeywords
This publication has 3 references indexed in Scilit:
- Plasma influence in tantalum sputteringJournal of Applied Physics, 1977
- Calculation of Ion Bombarding Energy and Its Distribution in rf SputteringPhysical Review B, 1968
- Interchange of Charge between Gaseous MoleculesThe Journal of Chemical Physics, 1960