Improvement of interface electronic properties of GaF3/GaAs MIS structures
- 1 January 1992
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 56-58, 888-893
- https://doi.org/10.1016/0169-4332(92)90355-2
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Electrical Properties of Gallium Fluoride(GaF3)/GaAs Interface with and without Sulfur TreatmentJapanese Journal of Applied Physics, 1990
- The Effect of (NH4)2S Treatment on the Interface Characteristics of GaAs MIS StructuresJapanese Journal of Applied Physics, 1988