Gas and surface processes leading to hydrogenated amorphous silicon films
- 31 August 1987
- journal article
- Published by Elsevier in Solar Cells
- Vol. 21 (1-4) , 147-152
- https://doi.org/10.1016/0379-6787(87)90114-1
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Mono- and disilicon radicals in silane and silane-argon dc dischargesJournal of Applied Physics, 1986
- Radical species in argon-silane dischargesApplied Physics Letters, 1983