Physical microstructure in device-quality hydrogenated amorphous silicon
- 1 July 1984
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 66 (1-2) , 81-86
- https://doi.org/10.1016/0022-3093(84)90302-8
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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- Microstructure and properties of rf-sputtered amorphous hydrogenated silicon filmsJournal of Applied Physics, 1981
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- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977