Formation of cobalt silicide under a passivating film of molybdenum or tungsten
- 1 May 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (3) , 1497-1502
- https://doi.org/10.1116/1.585456
Abstract
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