The effect of the rate of deposition on superconductive properties and structure of tin films
- 14 October 1979
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 12 (10) , 1781-1785
- https://doi.org/10.1088/0022-3727/12/10/020
Abstract
The effect of the real rate of deposition on the superconducting properties and structure of tin films deposited in vacuum on room-temperature amorphous substrates has been observed and studied for rates in the 5-200 AA s-1 range. It is suggested that the oxygen contamination coefficient K, and thus film purity, changes with the rate of deposition. At higher rates, above 100 AA s-1, pure smooth films were obtained, suitable for the fabrication of superconducting tunnel junctions.Keywords
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