Perfect selective and highly anisotropic electron cyclotron resonance plasma etching for WSix/poly-Si at electron cyclotron resonance position
- 1 September 1990
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 8 (5) , 1062-1067
- https://doi.org/10.1116/1.584961
Abstract
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