Growth of microprojections arising from sputter etching of Cu–Ag sandwich

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Abstract
It is demonstrated that the sputter etching of a Cu–Ag sandwich using a focused Ar+-ion beam creates a crater covered with densely distributed microprojections, offering a crater-edge profile poor in resolution. The projections grew in a variety of shapes, ranging from a rod to a wide-angle cone, and their number density reached ∼109/cm2. The dimensions of the projections were also not uniform, increasing discernibly with depth. It is believed that an enhanced surface mobility of Cu and Ag atoms during the sputtering played a role in growing the projections.

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