New substances for atomic-layer deposition of silicon dioxide
- 1 July 1995
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 187, 66-69
- https://doi.org/10.1016/0022-3093(95)00113-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Quasi-monolayer deposition of silicon dioxideThin Solid Films, 1994
- An FT-IR study of silicon dioxides for VLSI microelectronicsSemiconductor Science and Technology, 1990
- Cyanates of Silicon, Phosphorus and Boron. Instability of Certain Ternary Boron CompoundsJournal of the American Chemical Society, 1940