A four-vacuum-cycle lift-off process for the polycrystalline CdSe thin-film transistor

1 January 1985

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 6 (1) , 11-13
https://doi.org/10.1109/edl.1985.26025

Abstract

A photolithographic process is described for the fabrication of the polycrystalline CdSe thin-film transistor (TFT). This process only uses four vacuum cycles and four lift-off masks, without the need of sputter cleaning to prevent contamination. The devices made have a stability similar to the ones made by the single-vacuum process.

Keywords

THIN FILM TRANSISTORS
RESISTS
CLEANING
SUBSTRATES
CONTAMINATION
ISOLATORS
ANNEALING
SEMICONDUCTOR FILMS
FABRICATION
SANDWICH STRUCTURES

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