The microstructure and composition of oxide films formed during high temperature oxidation of a sintered silicon nitride
- 31 December 1989
- journal article
- Published by Elsevier in Journal of the European Ceramic Society
- Vol. 5 (4) , 245-256
- https://doi.org/10.1016/s0955-2219(89)80008-1
Abstract
No abstract availableKeywords
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