Microstructure trends in metal(aluminum, copper, indium, lead, tin)-metal oxide thin films prepared by reactive ion beam sputter deposition
- 1 April 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 102 (4) , 345-360
- https://doi.org/10.1016/0040-6090(83)90051-2
Abstract
No abstract availableKeywords
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