Structure characterization of plasma-deposited TiN coatings
- 15 May 1991
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 45 (1-3) , 67-72
- https://doi.org/10.1016/0257-8972(91)90207-d
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Plasma-assisted chemical vapor deposition of titanium nitride in a capacitively coupled radio-frequency dischargeJournal of Vacuum Science & Technology A, 1989
- The deposition rate and properties of the deposit in plasma enhanced chemical vapor deposition of TiNJournal of Vacuum Science & Technology A, 1989
- Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steelThin Solid Films, 1986