Electron spectroscopy study of hydrogenated amorphous carbon films formed by methane ion beam deposition
- 1 October 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 120 (3) , 231-238
- https://doi.org/10.1016/0040-6090(84)90299-2
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
- Thermopower of doped semiconducting hydrogenated amorphous carbon filmsSolid State Communications, 1982
- Electron spectroscopy of ion beam and hydrocarbon plasma generated diamondlike carbon filmsJournal of Vacuum Science and Technology, 1981
- Structure and properties of quasi-amorphous films prepared by ion beam techniquesThin Solid Films, 1980
- Chemical modification of the electrical properties of hydrogenated amorphous carbon filmsSolid State Communications, 1980
- Electrical and optical properties of hydrogenated amorphous carbon filmsJournal of Non-Crystalline Solids, 1980
- Preparation of hard coatings by ion beam methodsThin Solid Films, 1979
- Characterization of hard carbon films by electron energy loss spectrometryThin Solid Films, 1979
- Diamond-like carbon films produced in a butane plasmaThin Solid Films, 1979
- Technology of ion beam sources used in sputteringJournal of Vacuum Science and Technology, 1978
- Infrared transparent and amorphous carbon grown under ion impact in a butane plasmaThin Solid Films, 1978