The structural characterization of dc sputtered in situ YBa2Cu3O7−x thin films
- 31 October 1990
- journal article
- Published by Elsevier in Materials Letters
- Vol. 10 (3) , 126-132
- https://doi.org/10.1016/0167-577x(90)90045-n
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- In-situ YBa2Cu3O7−x thin films epitaxially grown by single target DC sputteringPhysica C: Superconductivity and its Applications, 1990
- Effect of Substrate Temperature and Composition on the Crystalline State of Ba2YCu3O7-δ Magnetron-Sputtered Thin FilmsJapanese Journal of Applied Physics, 1989
- Dependence of Superconducting Properties on Substrate Temperature in Y-Ba-Cu-O Thin Films Prepared by Magnetron SputteringJapanese Journal of Applied Physics, 1989
- d.c. sputtering elaboration of thin films of the high-Tc superconductor YBa2Cu3O7-x: evidence for strong film-substrate interactionsRevue de Physique Appliquée, 1988