Ion-plated titanium carbide coatings
- 1 May 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 22 (1) , 111-120
- https://doi.org/10.1016/0040-6090(74)90284-3
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973
- The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive EvaporationJournal of Vacuum Science and Technology, 1972
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- The Deposition of Multicomponent Phases by Ion PlatingJournal of Vacuum Science and Technology, 1972
- Sputtering Multilayered Conductor FilmsJournal of Vacuum Science and Technology, 1971