Chemical induction effects: O-incorporation in, and substitutional doping of a-Si:H
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 137-138, 119-122
- https://doi.org/10.1016/s0022-3093(05)80071-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Local structure of dopants in compensated and singly-doped amorphous siliconJournal of Non-Crystalline Solids, 1987
- Oxygen-bonding environments in glow-discharge-deposited amorphous silicon-hydrogen alloy filmsPhysical Review B, 1983
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976