Monitoring of thin film sputtering by soft X-ray emission spectroscopy
- 1 January 1990
- Vol. 41 (4-6) , 1275-1278
- https://doi.org/10.1016/0042-207x(90)93932-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Design and use of a vacuum system for high rate reactive sputtering of TiO2/TiN/TiO2 solar control filmsSolar Energy Materials, 1988
- Resonant behavior in soft x-ray fluorescence excited by monochromatized synchrotron radiationPhysical Review Letters, 1988
- Evidence for electron-induced x-ray emission in sputtering depositionApplied Physics Letters, 1986
- Design of a portable large spectral range grazing incidence instrumentNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1986
- Layered Synthetic Microstructures for Long Wavelength X-Ray SpectrometryPublished by SPIE-Intl Soc Optical Eng ,1985
- Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter depositionJournal of Vacuum Science and Technology, 1978