Plasma polymerized all-dry resist process for 0.25 μm photolithography

• 1 November 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (6) , 3909-3913
• https://doi.org/10.1116/1.587573

Abstract

Keywords

• PLASMA POLYMERIZED
• M PHOTOLITHOGRAPHY
• DRY RESIST
• RESIST PROCESS