Contamination analysis of TiO2 thin films deposited using ion assisted deposition
- 1 March 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 7-8, 906-909
- https://doi.org/10.1016/0168-583x(85)90492-6
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Ion-assisted deposition of optical thin films: low energy vs high energy bombardmentApplied Optics, 1984
- Ion-assisted deposition of bulklike ZrO2 filmsApplied Physics Letters, 1983
- Carburization of steel surfaces during implantation of Ti ions at high fluencesJournal of Vacuum Science & Technology A, 1983
- Ion-beam-assisted deposition of thin filmsApplied Optics, 1983
- Carbon-induced amorphous surface layers in Ti-implanted FeApplied Physics Letters, 1980
- Effect of ion bombardment during deposition on thick metal and ceramic depositsJournal of Vacuum Science and Technology, 1974