A simple technique for monitoring undercutting in plasma etching
- 30 September 1980
- journal article
- research article
- Published by Elsevier in Solid-State Electronics
- Vol. 23 (9) , 995
- https://doi.org/10.1016/0038-1101(80)90065-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Competitive Mechanisms in Reactive Ion Etching in a CF 4 PlasmaJournal of the Electrochemical Society, 1979
- Abstract: Plasma-assisted etching for pattern transferJournal of Vacuum Science and Technology, 1979