Impurity diffusion barrier for a-Si:H/SnO2 system
- 1 December 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 115 (1-3) , 81-83
- https://doi.org/10.1016/0022-3093(89)90367-0
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Diffusion of Constituent Atoms in P-type a-Si:H/SnO2 InterfacesJapanese Journal of Applied Physics, 1988
- Interaction of hydrogenated amorphous silicon films with transparent conductive filmsJournal of Applied Physics, 1983