Nanoindentation hardness, abrasive wear, and microstructure of TiN/NbN polycrystalline nanostructured multilayer films grown by reactive magnetron sputtering
- 1 September 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (5) , 3104-3113
- https://doi.org/10.1116/1.581466
Abstract
No abstract availableThis publication has 34 references indexed in Scilit:
- Nanoindentation studies of single-crystal (001)-, (011)-, and (111)-oriented TiN layers on MgOJournal of Applied Physics, 1996
- Ion induced stress generation in arc-evaporated TiN filmsJournal of Applied Physics, 1995
- Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixturesJournal of Vacuum Science & Technology A, 1994
- X-ray elastic constants and residual stress of textured titanium nitride coatingSurface and Coatings Technology, 1992
- An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experimentsJournal of Materials Research, 1992
- On the generality of the relationship among contact stiffness, contact area, and elastic modulus during indentationJournal of Materials Research, 1992
- Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructureJournal of Vacuum Science & Technology A, 1992
- Intrinsic stress in sputter-deposited thin filmsCritical Reviews in Solid State and Materials Sciences, 1992
- Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solidsComputer Physics Communications, 1988
- Surface Studies of Solids by Total Reflection of X-RaysPhysical Review B, 1954