Soft x-ray reflectometry of multilayer coatings using a laser-plasma source

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Abstract
A new high-resolution soft x-ray reflectometer system utilizing a laser-plasma light source is described. This reflectometer is used to measure the reflectance of multilayer-coated optics for projection lithography. A detailed description of the instrument is presented, along with recent results obtained for a variety of soft x-ray multilayer coatings, multilayer-coated figured optics, and patterned x-ray reflection masks

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