Structure of polycrystalline silicon films deposited at low temperature by plasma CVD on substrates exposed to different plasma
- 1 January 1999
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 337 (1-2) , 27-31
- https://doi.org/10.1016/s0040-6090(98)01170-5
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
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