Dry Etching of Nb and Fabrication of Nb Variable-Thickness-Bridges
- 1 January 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (1)
- https://doi.org/10.1143/jjap.20.259
Abstract
Several reactive dry etching methods; ion etching, sputter etching and plasma etching, were studied in order to fabricate a niobium variable-thickness type thin film bridge (VTB). Niobium was etched by CF4 reactive sputter etching with submicron accuracy and no significant influence on the superconducting transition temperature except very near the surface (I c R n product obtained was at least 0.42 mV.Keywords
This publication has 9 references indexed in Scilit:
- Properties of niobium superconducting bridges prepared by electron-beam lithography and ion implantationJournal of Applied Physics, 1979
- Microwave response of superconducting variable-thickness microbridgesJournal of Applied Physics, 1979
- Variable-thickness-type microbridges made of thin Nb filmsJournal of Applied Physics, 1979
- Heating and flux flow in niobium variable-thickness bridgesJournal of Applied Physics, 1978
- Control ofTcfor Niobium by N Ion ImplantationJapanese Journal of Applied Physics, 1977
- Ion-surface interactions in plasma etchingJournal of Applied Physics, 1977
- Properties of superconducting rf sputtered ultrathin films of NbJournal of Vacuum Science and Technology, 1976
- Superconducting weak links formed by ion implantationApplied Physics Letters, 1975
- Self-heating hotspots in superconducting thin-film microbridgesJournal of Applied Physics, 1974