Reactive ion etching of GaAs, AlGaAs, and GaSb in Cl2 and SiCl4

• 1 July 1990
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B
• Vol. 8  (4) , 607-617
• https://doi.org/10.1116/1.585027

Abstract

Keywords

• REACTIVE ION ETCHING