GREG: A New Hotwall‐Close‐Spaced Vapor Transport Deposition System
- 1 March 1985
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 132 (3) , 709-711
- https://doi.org/10.1149/1.2113937
Abstract
We describe a new hotwall‐C.S.V.T. deposition system, GREG, which is especially suitable for high temperature deposition of large grained, high quality layers of II–VI compounds on common substrates. High growth rates and large deposited area are among the advantages claimed for this technique, which produced layers of and with good crystalline orientation and large grain size.Keywords
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