Erratum: The thermal stability of SiGe films deposited by ultrahigh vacuum chemical vapor deposition [J. Appl. Phys. 70, 1416 (1991)]
- 1 December 1991
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (11) , 7194
- https://doi.org/10.1063/1.350386
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Defects associated with the accommodation of misfit between crystalsJournal of Vacuum Science and Technology, 1975