Low Temperature Preparation of SnO2 Film by Photo CVD with Sn(CH3)4-O2 or O3 System.
- 1 January 1994
- journal article
- Published by The Surface Finishing Society of Japan in Journal of The Surface Finishing Society of Japan
- Vol. 45 (5) , 547-548
- https://doi.org/10.4139/sfj.45.547
Abstract
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