Deposition of superhard amorphous carbon films by pulsed arc sources
- 1 August 1997
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 25 (4) , 685-688
- https://doi.org/10.1109/27.640686
Abstract
Hydrogen-free amorphous carbon films with hardness comparable to crystalline superhard materials have been deposited by special pulsed arc techniques. With the combination of very high hardness, hig smoothness, and low adhesion activity to other materials which are in contact with them, these films show superior behavior in wear and slide applications. The influence of plasma and deposition conditions on these film properties and the choice of optimum conditions are discussedKeywords
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