Photoelectric determination of the changes in work function of nickel, rhodium and platinum films by nitrogen adsorption
- 1 July 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 17 (1) , S7-S11
- https://doi.org/10.1016/0040-6090(73)90015-1
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Crystal face specificity of nitrogen adsorption on a platium field emission tipSurface Science, 1973
- Photoelectric determination of the work function of Ru-films as a function of sintering temperature (78°K–925°K)Surface Science, 1971
- Photoelektrische Untersuchungen der Adsorption von Kohlenmonoxyd auf PlatinfilmenBerichte der Bunsengesellschaft für physikalische Chemie, 1970
- Surface potential measurements on nickel and iron films during the chemisorption of ammonia, nitrogen, and hydrogenJournal of Catalysis, 1962
- Studies in contact potentials. Part I.—The adsorption of some gases on evaporated nickel filmsDiscussions of the Faraday Society, 1950