Growth of a-Si:H Films by Remote Plasma Enhanced CVD (RPECVD)
- 1 January 1988
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Glow-discharge amorphous silicon: Growth process and structureMaterials Science Reports, 1987
- Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor depositionJournal of Vacuum Science & Technology A, 1987
- Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor depositionPhysical Review B, 1986
- Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous siliconThin Solid Films, 1982
- High-pressure helium afterglow at room temperaturePhysical Review A, 1976