Comparison of Dry Etching Techniques for III‐V Semiconductors in CH 4 / H 2 / Ar Plasmas
- 1 February 1996
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 143 (2) , 752-758
- https://doi.org/10.1149/1.1836513
Abstract
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