X-ray photoelectron spectroscopy study on the electrical double layer at an Al2O3–Al interface
- 1 September 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 10 (5) , 2991-2995
- https://doi.org/10.1116/1.577898
Abstract
Upon oxidation of a clean Al surface, an electrical double layer (EDL) is formed at the Al–Al2O3 interface. This EDL is investigated using x-ray photoelectron spectroscopy data available in the literature. The EDL strength, measured as a potential difference across the EDL, depends on the Al surface and the oxidation process. The polarity of the EDL is however invariably the same: the Al2O3 side of the Al–Al2O3 interface is always positively charged. The reduction of the Al work function upon oxidation is attributed to this EDL. The asymmetry in the potential barrier shape formed in Al–Al2O3–Al sandwiches is also attributed to a strong EDL at the electrode-film interface and a weaker EDL at the interface between the counter electrode and the film.Keywords
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