Glancing Angle Dependence of the X-Ray Emission Measured under Total Reflection Angle X-Ray Spectroscopy (TRAXS) Condition during Reflection High Energy Electron Diffraction Observation
- 1 October 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (10B) , L1503
- https://doi.org/10.1143/jjap.31.l1503
Abstract
We measured the glancing angle (θg) dependence of the X-ray emission from Si(111)-√3×√3-Ag and α-√3×√3-Au surfaces during Reflection High Energy Electron Diffraction observation under the Total Reflection Angle X-ray Spectroscopy condition. The characteristic X-rays AgL and AuM decreased according to 1/sin θg. The function 1/sin θg is easily understood in terms of Ag and Au atoms located at the top layer of the surface. The SiK and the bremsstrahlung showed broad peaks around 8°. These trends of the curves are explained by an analysis using Monte Carlo electron trajectory simulation. By measuring the glancing angle dependence we can easily distinguish whether or not a specific kind of atom is confined at the top layer of the surface.Keywords
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