The morphology of thick oxide films on Zircaloy-2
- 31 May 1973
- journal article
- Published by Elsevier in Journal of Nuclear Materials
- Vol. 47 (1) , 72-78
- https://doi.org/10.1016/0022-3115(73)90188-8
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Comments on the paper “the influence of oxide stress on the breakaway oxidation of Zircaloy-2” by D. H. Bradhurst and P. M. HeuerJournal of Nuclear Materials, 1971
- Etude de la croissance de l'oxyde sur le zirconium et le zircaloy-2Journal of Nuclear Materials, 1971
- X-ray diffraction analyses of zirconia films on zirconium and zircaloy-2Journal of Nuclear Materials, 1970
- The influence of oxide stress on the breakaway oxidation of zircaloy-2Journal of Nuclear Materials, 1970
- Processes occurring during the breakdown of oxide films on zirconium alloysJournal of Nuclear Materials, 1969
- A porosimeter for determining the sizes of flaws in zirconia or other insulating films “In Situ”Journal of Nuclear Materials, 1968
- Etude micrographique du processus de desquamation (“break-away”) au cours de l'oxydation du zirconiumJournal of the Less Common Metals, 1968
- The kinetics and mechanism of the oxidation of zircaloy-2 at 350–500 °CJournal of Nuclear Materials, 1968
- Studies on the Oxygen Gradients in Oxidizing MetalsJournal of the Electrochemical Society, 1965
- Multiple Rate Transitions in the Aqueous Corrosion of ZircaloyJournal of the Electrochemical Society, 1962