Recent advancements in high intensity heavy negative ion sources based on the sputter principle
- 1 February 1990
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
- Vol. 287 (1-2) , 139-149
- https://doi.org/10.1016/0168-9002(90)91785-a
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- A versatile high intensity plasma sputter heavy negative ion sourceNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1988
- An axial geometry cesium sputter negative ion source with continuous tungsten surface ionizerNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1986
- A radial geometry cesium plasma source with improved mechanical featuresNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1986
- Negative Ion Sources Equipped with Continuous Annular and Spherical Geometry Surface IonizersIEEE Transactions on Nuclear Science, 1985
- A versatile high intensity negative ion sourceNuclear Instruments and Methods in Physics Research, 1983
- Secondary-ion emission probability in sputteringPhysical Review B, 1979
- Work-Function Dependence of Negative-Ion Production during SputteringPhysical Review Letters, 1978
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
- II. The energy spectrum of ejected atoms during the high energy sputtering of goldPhilosophical Magazine, 1968
- Emission of Negative Ions from Metal Surfaces Bombarded by Positive Cesium IonsJournal of Applied Physics, 1962