A New Method of Making Extremely Thin Films
- 1 December 1935
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 6 (12) , 401-403
- https://doi.org/10.1063/1.1751910
Abstract
A method for making extremely thin films has been developed for general use. A hole or slit in a metal plate is filled with a volatile solid and the surface is polished flat. This plate is clamped to the lower end of a liquid air container which extends into a high vacuum chamber. The material to be deposited is evaporated and covers slit and plate with a continuous film of desired thickness. The slit is then placed into the apparatus for the investigation of the film, and on evacuation the volatile material evaporates leaving the thin film supported on the slit. Camphor and naphthalene have been used as volatile material. For investigations in which residues of organic substances have to be avoided ammonium chloride, which may be driven off in vacuum at about 220°C, can be used to support the film.Keywords
This publication has 1 reference indexed in Scilit:
- The Origin of the "Extra Rings" in Electron Diffraction PatternsPhysical Review B, 1935