Laser reactive ablation deposition of silicon-nitride films

• 1 February 1995
• journal article
• Published by Springer Nature in Applied Physics A
• Vol. 60  (3) , 275-283
• https://doi.org/10.1007/s003390050099

Abstract

Keywords

• X RAY PHOTOELECTRON SPECTROSCOPY
• LOW PRESSURE
• X RAY DIFFRACTION
• SILICON WAFER
• SCANNING ELECTRON MICROSCOPY
• AUGER ELECTRON SPECTROSCOPY