The role of HCl in the passivation of MOS structures
- 1 November 1972
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 13 (1) , 11-14
- https://doi.org/10.1016/0040-6090(72)90146-0
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Neutralization of Na+ Ions in ``HCl-Grown'' SiO2Applied Physics Letters, 1972
- The Effect of HCl and Cl[sub 2] on the Thermal Oxidation of SiliconJournal of the Electrochemical Society, 1972
- A bibliography of metal-insulator-semiconductor studiesIEEE Transactions on Electron Devices, 1967
- Dielectric relaxation in thermally grown SiO2filmsIEEE Transactions on Electron Devices, 1966