Formation of Semiconducting Polymer Film by Laser CVD.
Open Access
- 1 January 1997
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 10 (2) , 197-204
- https://doi.org/10.2494/photopolymer.10.197
Abstract
The thin films of semiconducting polymers such as poly(N-vinylcarbazole), polythiophene, polypyrrole, and polyaniline were formed by the laser chemical vapor deposition (CVD). The 355-nm laser excitation of N-vinylcarbazole deposited on a quartz substrate gave the poly(N-vinylcarba-zole) film with the molecular weight Mw=11860 (Mw/Mn=7.18). The sandwich excimer/second excimer emission ratio of the time-resolved emission spectra suggested the isotactic structure of the poly(N-vinylcarbazole) film prepared by the laser CVD. The micropatterns of the poly(N-vinylcarbazole) with the resolution of about 20μm were formed by the laser irradiation through a photomask. The laser flash photolysis of the N-vinylcarbazole showed the generation of the radical cation, which suggests the cationic polymerization mechanism. The optical band gap of polythiophene film was decreased with increasing laser excitation power.Keywords
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