Optimization of the sputter-deposition process for preparing smooth coatings of beryllium on microspherical substrates
- 1 January 1988
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 6 (1) , 128-133
- https://doi.org/10.1116/1.574994
Abstract
The process of physical vapor deposition of beryllium by magnetron sputtering is studied in broad terms of major operational parameters. Optimal conditions are established for the preparation of Be coatings on glass microspheres. The coatings prepared in both dc and rf modes displayed 200–300 Å surface finish. Such superior surface finish is made possible by the application of a modest, negative bias voltage to the substrate that suppresses columnar growth and promotes nucleation as a result of resputtering.Keywords
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