Low Pressure Deposition of Doped SiO2 by Pyrolysis of Tetraethylorthosilicate (TEOS): II . Arsenic Doped Films
- 1 October 1989
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 136 (10) , 3033-3043
- https://doi.org/10.1149/1.2096398
Abstract
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