Reactive Ion Etching of Piezoelectric Films for Acoustic Wave Devices
- 1 January 1982
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Sputtered AlN Films for Bulk-Acoustic-Wave DevicesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1981
- Etching Uniformities of Silicon in CF 4 + 4 % O 2 PlasmaJournal of the Electrochemical Society, 1979
- Thin film MOSFET’s fabricated in laser-annealed polycrystalline siliconApplied Physics Letters, 1979
- Flow rate effects in plasma etchingJournal of Vacuum Science and Technology, 1978
- Ion-surface interactions in plasma etchingJournal of Applied Physics, 1977