An x-ray photoelectron spectra and atomic force microscopy characterization of silica substrates engineered with a covalently assembled siloxane monolayer
- 16 August 2005
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 16 (10) , 2170-2175
- https://doi.org/10.1088/0957-4484/16/10/033
Abstract
Silica substrates were functionalized with a covalent 4-ClCH(2)C(6)H(4)SiCl(3) monolayer. Additional covalent bonding of appropriate functional molecules to the silylated substrates was further achieved. The surface chemical characterization was carried out by angle resolved x-ray photoelectron measurements. Moreover, surface morphological characterizations were performed by atomic force microscopy measurements. Present results provide step by step information on the covalently linked monolayer during the synthetic procedure.Keywords
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