Nucleation and growth of ultrathin pentacene films on silicon dioxide: effect of deposition rate and substrate temperature
- 3 November 2004
- journal article
- Published by Elsevier in Synthetic Metals
- Vol. 146 (3) , 387-391
- https://doi.org/10.1016/j.synthmet.2004.08.017
Abstract
No abstract availableKeywords
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