New x-ray source for lithography
- 11 December 1989
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 55 (24) , 2559-2560
- https://doi.org/10.1063/1.101981
Abstract
We propose the use of electromagnetic waves as an undulator in order to generate x rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi-optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x rays of the desired energy. The scaling of the x-ray power with wavelength indicates that the throughput can be increased by using resists which are sensitive to shorter wavelength x rays.Keywords
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