Study on organosilicon positive resist. II. Organosilicon positive photoresist (OSPR–1334) and its application to bilayer resist system
- 25 March 1992
- journal article
- research article
- Published by Wiley in Journal of Applied Polymer Science
- Vol. 44 (9) , 1583-1590
- https://doi.org/10.1002/app.1992.070440910
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